New optimization method of the exposure with alternative phase shifting masksKIKUCHI, Koji; OHNUMA, Hidetoshi; KAWAHIRA, Hiroichi et al.SPIE proceedings series. 2001, pp 41-51, isbn 0-8194-4111-2Conference Paper

New mask data verification method after optical proximity effect correctionOGAWA, Kazuhisa; ASHIDA, Isao; KAWAHIRA, Hiroichi et al.SPIE proceedings series. 2001, pp 186-193, isbn 0-8194-4111-2Conference Paper

Compositional analysis of progressive defects on a photomaskSAGA, Koichiro; KAWAHIRA, Hiroichi.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673019.1-673019.7, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Photomask and next-generation lithography mask technology IX (Yokohama, 23-25 april 2002)Kawahira, Hiroichi.SPIE proceedings series. 2002, isbn 0-8194-4517-7, XXX, 918 p, isbn 0-8194-4517-7Conference Proceedings

Photomask and next-generation lithography mask technology VIII (Yokohama, 25-27 April 2001)Kawahira, Hiroichi.SPIE proceedings series. 2001, isbn 0-8194-4111-2, XV, 738 p, isbn 0-8194-4111-2Conference Proceedings

Focused ion beam repair for quartz bump defect of alternating phase shift masksKAGAMI, Ichiro; KAKUTA, Daichi; KOMIZO, Tohru et al.SPIE proceedings series. 2001, pp 563-573, isbn 0-8194-4111-2Conference Paper

Optimization of fabrication process for dual trench type alternating-PSMKOMIZO, Tohru; KAGAMI, Ichiro; KAKUTA, Daichi et al.SPIE proceedings series. 2001, pp 125-131, isbn 0-8194-4111-2Conference Paper

Advanced pattern correction method for fabricating highly accurate reticlesSATO, Shunichiro; KOYAMA, Masaaki; KATSUMATA, Mikio et al.SPIE proceedings series. 2002, pp 196-204, isbn 0-8194-4517-7, 9 p.Conference Paper

Convergence-based OPC method for dense simulationsDESOUKY, Tamer.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 71221M.1-71221M.8, 2Conference Paper

Advanced data preparation and design automationSCHELLENBERG, F. M.SPIE proceedings series. 2002, pp 54-65, isbn 0-8194-4517-7, 12 p.Conference Paper

Distributed hierarchical processingDEPESA, Paul; KEOGAN, Danny.SPIE proceedings series. 2002, pp 85-90, isbn 0-8194-4517-7, 6 p.Conference Paper

Electron beam lithography simulation for mask making, Part VI: Comparison of 10 and 50 kv GHOST proximity effect correctionMACK, Chris A.SPIE proceedings series. 2001, pp 194-203, isbn 0-8194-4111-2Conference Paper

Simulation-based defect printability analysis for 0.13μm technologyTINAZTENE, Cihan; KAGAMI, Ichiro.SPIE proceedings series. 2001, pp 518-519, isbn 0-8194-4111-2Conference Paper

Diamonds in the Rough: Key Performance Indicators for Reticles and Design SetsACKMANN, Paul.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 71222M.1-71222M.17, 2Conference Paper

Novel CD measurement and precise pattern size extraction method for optical imagesFAIVISHEVSKY, Lev.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 71223C.1-71223C.8, 2Conference Paper

Development status of EUVL mask blanks in AGCHAYASHI, Kazuyuki.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67305D.1-67305D.7, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Lithography technology trend for DRAM devicesHAN, Woo-Sung.SPIE proceedings series. 2002, pp 15-25, isbn 0-8194-4517-7, 11 p.Conference Paper

Resolution enhancement techniques in optical lithography, it's not just a mask problemLIEBMANN, Lars W.SPIE proceedings series. 2001, pp 23-32, isbn 0-8194-4111-2Conference Paper

Don't kill Canaries!: introducing a new test-device to assess the electrostatic risk-potential to photo-masksSEBALD, Thomas.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 71220H.1-71220H.12, 2Conference Paper

Photomask technology 2007 (18-21 September, 2007, Monterey, California, USA)Naber, Robert J; Kawahira, Hiroichi.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6887-1, 3 vol, isbn 978-0-8194-6887-1Conference Proceedings

A method for generating complementary mask data for an EPL stencil mask using a commercial pattern operation toolMONIWA, Akemi; MURAI, Fumio.SPIE proceedings series. 2002, pp 816-826, isbn 0-8194-4517-7, 11 p.Conference Paper

Evaluation of aperture mask degradation in electron beam lithography using line edge roughness of resist patternsYOSHIZAWA, M; MORIYA, S.SPIE proceedings series. 2001, pp 718-725, isbn 0-8194-4111-2Conference Paper

Development status of EUVL mask blanksSHIROMO, Kazuaki.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 712225.1-712225.9, 2Conference Paper

130 nm reticle inspection using multi-beam UV wavelength database inspectionAQUINO, Christopher; SCHLAFFER, Robert.SPIE proceedings series. 2002, pp 542-553, isbn 0-8194-4517-7, 12 p.Conference Paper

Metrology methods comparison for 2D structures on binary and embedded attenuated phase shift masksLASSITER, Matthew; EVNON, Beniamin.SPIE proceedings series. 2002, pp 769-774, isbn 0-8194-4517-7, 6 p.Conference Paper